The Yale Cleanroom contains all the essential tools for contact photolithography. HMDS primer ovens are available for improved resist adhesion. Spinners are available for positive, negative, and e-beam resists, a mask writer capable of creating features down to 0.5 microns, and a contact aligner capable of soft contact, hard contact, and flood exposure.

Most CAD software can be used to design masks, but the cleanroom staff recommend using LayoutEditor, available free for cleanroom users.

For designs with features smaller than 0.5 microns e-beam lithography resources are available at theĀ Yale Institute for Nanoscience and Quantum Engineering.

Spinner Hoods