The Maskless Aligner MLA 150 is a state-of-the-art maskless lithography tool. Depending on the application, the MLA 150 patterns high-resolution, high aspect ratio, and even simple grayscale structures. Due to the maskless approach, any design modifications can be quickly implemented by simply changing the CAD layout. The system also features fast automated front- and backside alignment procedures and outstanding speed: Exposing an area of 100 x 100 mm² with structures as small as 1 µm takes less than 10 minutes.