Heidelberg DWL-66 Laser Mask Writer

The Heidelberg DWL66fs laser writer uses a 405 nm laser source to pattern masks for contact lithography, and direct writes on wafers for small-batch applications. Its self-contained environment ensures repeatable results over multiple runs. It can obtain a minimum feature size of 0.5 microns. Mask patterns can be generated using LayoutEditor, a software package freely available to Yale researchers. For more information on LayoutEditor, contact a staff member.