SSI Solaris RTA

Quick Info

Summary

The Solaris 150 is a manual loading benchtop RTP system for R&D and pre-production, it can process up to 150mm substrates at a temperature range from RT-1300 degrees.  The unique temperature measurement system of the Solaris requires virtually no calibration for different wafer types and backside emmissivity differences.  The Solaris uses a unique PID process controller that ensures accurate temperature stability and uniformity.

Details
Internal Rate: 
Included with access

Gases: O2, Ar, N2, N2/H2 (Forming Gas)
Wafer sizes:   2”, 3”, 4”, 5” and 6” wafers and pieces
Ramp up rate:  1-200°C per second
Steady state duration: 0-600 seconds per step
Ramp down rate: Temperature Dependent, max 150°C per second
Recommended steady state temperature range: 200°C - 1250°C
Thermocouple temperature accuracy: +/- 2.5°C
Temperature repeatability:   +/- 3°C or better at 1150°C wafer-to-wafer
Temperature uniformity @ 1150°C: +/- 5°C across a 6” (150 mm) wafer