Gas Selection: Cl2, BCl3, CH4, SF6, CHF3, CF4, O2, Ar, H2
Coil and Bias Powers: 600 W and 3000 W
Compatible Materials*: Si, SiO, SiN, GaAs, GaN, Al, AlN, AlO, LiNbO, InP, Parylene, HBN, FTO, MoS2, Carbon, Ni, SiC, +PR, -PR, PMMA
Banned Materials*: Au, Ag, Pt, Cu, Magnetics
*Due to the ever-changing nature of research, and the sensitive nature of the equipment these lists are incomplete. Please contact a staff member to discuss etch plans before attempting to introduce a new material to the system.