Gas Selection: O2, SF6, CF4, CHF3, Ar
Coil and Bias Powers: 600 W and 600 W
Allowed Materials*: Si, SiO, SiN, Nb, NbN, Ta, Ge, Positive resist, PMMA
Banned Materials*: Au, Ag, Pt, Cu, Most other materials.
*Due to the ever-changing nature of research, and the sensitive nature of the equipment these lists are incomplete. Please contact a staff member to discuss etch plans before attempting to etch a new material.