Gas Selection: O2, SF6, C4F8, Ar, CF4, CHF3
Coil and Bias Powers: 600 W and 3000 W
Allowed Materials*: Si, SiO, SiN, Al, Al2O3, AlN, Ni, Cr, Positive resist, PMMA
Banned Materials*: Most other materials.
*Due to the ever-changing nature of research, and the sensitive nature of the equipment these lists are incomplete. Please contact a staff member to discuss etch plans before attempting to etch a new material.